3

Plasma nitriding in low pressure in an ECR microwave plasma

Year:
1998
Language:
english
File:
PDF, 353 KB
english, 1998
5

Early formation of thick diamond films on Si substrates

Year:
1998
Language:
english
File:
PDF, 443 KB
english, 1998
14

Sheath Characteristic in ECR Plasma Nitriding

Year:
2001
Language:
english
File:
PDF, 371 KB
english, 2001
15

Adjustment of electron temperature in ECR microwave plasma

Year:
2003
Language:
english
File:
PDF, 113 KB
english, 2003